ICP CVD system for Graphene and Boron Carbide Layers

ICP CVD system for Graphene and Boron Carbide Layers


Negotiable Min Order Quantity Unit

Required Quantity
Place of Origin
Payment Terms
Negotiable
Production method
Negotiable
Shipping / Lead Time
Negotiable / Negotiable
Keyword
cvd
Category
Other Machinery & Industry Equipment
tK Meet
tK Meet

Apply a video call to the Supplier

SEND TO SUPPLIER INQUIRY

A-Tech System, Inc.

Country / Year Established
South Korea South Korea /
Business type
Others
Verified Certificate

12

DUNS

Product name ICP CVD system for Graphene and Boron Carbide Layers Certification -
Category Other Machinery & Industry Equipment Ingredients -
Keyword cvd Unit Size -
Brand name - Unit Weigh -
origin Stock -
Supply type - HS code -

Product Information

Graphene synthesis

Special Features

Multi-functional CVD system combined with ICP CVD and probe station.
Maximum substrate temperature: 1,000°C.
Automatic loading available during susceptor heating.
High density plasma source.
PC-control system.

Specifications

Wafer capacity : 6" wafer x 1
Average throughput: 4,800 wafer/year
Dimension : 1,500W × 1,800D × 1,830H (mm3)
Power : ICP Power supply
Bias power supply
Heater : Heating element - SiC coated graphite(max. temp.:1,200°C)
Gas : Ar/CH4/H2/B2H2/C2H2/O2/N2/NH3
Pump : dry pump, turbo pump, booster pump

B2B Trade

Price (FOB) Negotiable transportation -
MOQ Negotiable Leadtime Negotiable
Payment Options Negotiable Shipping time Negotiable

A-Tech System, Inc.

Country / Year Established
South Korea South Korea /
Business type
Others

12

DUNS

President
Cho, Young Sang
Address
175-25, Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, 403-853, Rep. Korea
Product Category
Machinery & Parts
Company introduction

Developed itmes

- Ion beam source
- Arc source
- Filtered cathodic vacuum arc system and process
- LPCVD for nanotube synthesis
- Silica PECVD system
- UHV(Ultra High Vacuum) sputtering system
- Silica TCP (Transformer Coupled Plasma) etcher
- UHV-sputter system for ferromagnetic multilayers
- Vacuum arc system for nitrides deposition
- In-line system of vacuum arc deposition for protecting PDP
  electrodes
- High vacuum test system for a flat light source evaluation
- Multifunctional standard sputtering system for R&D
- NPPN(New Post Plasma Nitriding) System
- Sputter for polygon mirror applicable to laser printer
- Production scale of arc ion plating (AIP) system
- Ion beam sputter for precision optics
- Production scale of AIP and NPPN systems
- Ion plating system for various coloration
- Pilot scale of arc discharge equipment for CNT transparent electrode
  sputter web coater for flexible display research
- Sputter system for ophthalmic
- Polycrystalline silicon ingot growing equipment
- PECVD system for anti-reflective coatings on solar cell
- PECVD system for graphene deposition
- Al plasma nitriding equipment for mass production with KAITECH
- Equipment of carbon nanotube using electrical arc discharge method
- Graphene PECVD-PVD Cluster equipment

Main Product

Related Products

Other buyers also search

Membership Grade

BUYER

Biz Pro VIP

SELLER

Biz Pro VIP
팝업닫기
Live Chat A new message arrives
from a business partner.

No Data

  • There is no data to load
  • Check out the My tK > My Inquiries list.
  • After agreeing to the use of the Live Chat service, the list is printed only when there is at least one history of receiving or sending a Live Chat request.

If you have not yet agreed to use the Live Chat service,

You can use the Live Chat freely after agreeing to the use of the Live Chat service.

View more
View more