Oder-made Focused lon Beam System
Negotiable Min Order Quantity Unit
- Required Quantity
-
- Place of Origin
- Payment Terms
- Negotiable
- Production method
- Negotiable
- Shipping / Lead Time
- Negotiable / Negotiable
- Keyword
- fib, focused ion beam
- Category
- Other Constructions
Apply a video call to the Supplier
A-Tech System, Inc.
- Country / Year Established
-
South Korea
/
- Business type
- Others
- Verified Certificate
-
12
| Product name | Oder-made Focused lon Beam System | Certification | - |
|---|---|---|---|
| Category | Other Constructions | Ingredients | - |
| Keyword | fib , focused ion beam | Unit Size | - |
| Brand name | - | Unit Weigh | - |
| origin | Stock | - | |
| Supply type | - | HS code | - |
Product Information
System Size : 2,200mm(W)x950mm(D)x1,800mm(H)
Sample Size : Resolution : 30k
Control Panel : Raith Lithography Module
Probe Current : 1pA - 15nA
Acceleration Voltage : 30kV
Emitter : Ga Liquid metal ion source
Gas Injection System : Up to two different precursors
Stage : 5-axis stage
Detector : Everhart Thomley type SE detector
Chamber : 400 mm(W)x700mm(D)x440 mm (H)
Image Acquisition and Image Display :
-Resolution : 1,280x960 pixel Processing: pixel averaging, frame/line averaging and integration.
-System Control : Integrated smart user interface based on Windows XP operating system, controlled by mouse, key board and control panel.
B2B Trade
| Price (FOB) | Negotiable | transportation | - |
|---|---|---|---|
| MOQ | Negotiable | Leadtime | Negotiable |
| Payment Options | Negotiable | Shipping time | Negotiable |
- President
- Cho, Young Sang
- Address
- 175-25, Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, 403-853, Rep. Korea
- Product Category
- Machinery & Parts
- Company introduction
-
Developed itmes
- Ion beam source
- Arc source
- Filtered cathodic vacuum arc system and process
- LPCVD for nanotube synthesis
- Silica PECVD system
- UHV(Ultra High Vacuum) sputtering system
- Silica TCP (Transformer Coupled Plasma) etcher
- UHV-sputter system for ferromagnetic multilayers
- Vacuum arc system for nitrides deposition
- In-line system of vacuum arc deposition for protecting PDP
electrodes
- High vacuum test system for a flat light source evaluation
- Multifunctional standard sputtering system for R&D
- NPPN(New Post Plasma Nitriding) System
- Sputter for polygon mirror applicable to laser printer
- Production scale of arc ion plating (AIP) system
- Ion beam sputter for precision optics
- Production scale of AIP and NPPN systems
- Ion plating system for various coloration
- Pilot scale of arc discharge equipment for CNT transparent electrode
sputter web coater for flexible display research
- Sputter system for ophthalmic
- Polycrystalline silicon ingot growing equipment
- PECVD system for anti-reflective coatings on solar cell
- PECVD system for graphene deposition
- Al plasma nitriding equipment for mass production with KAITECH
- Equipment of carbon nanotube using electrical arc discharge method
- Graphene PECVD-PVD Cluster equipment
- Main Product
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