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Thin Film Etchant

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Category: Other Chemicals

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Taekwang Trading Co., Ltd.

Country / Year Established: South Korea /

Business type: Others

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DUNS

Minisite Follow Company

PRODUCT DESCRIPTION COMPANY INFORMATION Related Products

Product name	Thin Film Etchant	Certification	-
Category	Other Chemicals	Ingredients	-
Keyword	-	Unit Size	-
Brand name	-	Unit Weigh	-
origin		Stock	-
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Product Information

Semiconductor and Thin Film Etchants for Microelectronic Circuits

THIN FILM	TRANSENE ETCHANTS	OPERATING RANGE	RECOMMENDED RESIST	APPLICATION
Al	ALUMINUM ETCHANTS TYPE A TYPE D	at25 °C at 40 °C 30Å/sec 80Å/sec 40Å/sec 125Å/sec	Negative* & Positive	Semiconductor & Integrated Circuits GaAs & GaP Devices
Al2O3	TRANSETCH N	120 Å/sec at 180 °C	SiO2	Semiconductor Devices
BOE	BUFFERED OXIDE ETCHANT	Variable	Negative* & Positive	Semiconductor & Integrated Circuits
Co2Si	Cobalt Silicide	10Å/sec at 25 oC	Negative* & Positive	Microelectronics
Cr	CHROMIUM ETCHANTS CRE-473 Chromium Mask TFD 1020 1020AC	at 25 °C at 40 °C 14Å/sec 25Å/sec 50Å/sec	Negative* & Positive	Thin Film Circuits
Cr-Si Cr-SiO	CHROMIUM CERMET TFE	1000Å/min at 50 °C	Negative*	Thin Film Circuits
Cu	COPPER ETCHANTS CE-100 CE-200 APS-100 Copper Etch 49-1 Copper Etch BTP	1 mil/min at 50 °C 0.5 mil/min at 50 °C 80Å/sec at 40 °C	Screen Resists Positive & Negative	P.C.Boards Thin Film Circuits
GaAs	GALLIUM ARSENIDE GA ETCH 100 GA ETCH 200 GA ETCH 300 AB ETCH	100Å/sec at 40 °C 20Å/sec at 5 °C 22Å/sec at 25 °C Defect Delineation	Negative	Microelectronic Circuits Semiconductor Testing
GaN	GALLIUM NITRIDE	80 A/min	SiO2	LED
Ga2O3	GALLIUM OXIDE	10 sec at 25 °C	Negative	Microelectronic Circuits
GaP	GALLIUM PHOSPHIDE	A Face(Ga): 115 micron/hr at 80 °C B Face (P): 210 micron/hr at 80 °C	Negative	Light Emitting Diodes
Ge	GERMANIUM	250Å/sec at 20 °C	Negative* & Positive	Semiconductor Devices
GaN	Gallium Nitride	80Å/min at 180 °C	SiO2	Semiconductor and Integrated Circuits
Au	GOLD ETCHANTS TFA TFAC GE-8148 GE-8110 GE-8111	28Å/sec at 25 °C 10Å/sec at 25 °C 50Å/sec at 25 °C 15Å/sec at 25 °C 15Å/sec at 25 °C	Negative* & Positive	Thin Film Circuits GaAs compatible Ni compatible
In2O3 ITO	INDIUM OXIDE INDIUM TIN OXIDE	30 min at 25 °C	Negative	Microelectronic Circuits
InP	INDIUM PHOSPHIDE	30 mins at 25 °C	Negative	Microelectronic Circuits
Fe2O3	IRON OXIDE MASK ETCHANT ME-10 ME-30	50Å/sec at 25 °C 25Å/sec at 25 °C	Negative* & Positive	Microelectronic Circuits
Polyimide	KAPTON POLYIMIDE ETCHANT	0.013 mil/min at 40 °C 0.07 mil/min at 60 °C	Negative* & Positive	Polyimide/Copper Clad Laminates
Mo	MOLY ETCHANT TFM	55Å/sec at 30 °C 85Å/sec at 60 °C	Negative*	Microelectronic Circuits
Nb NbN NbO	Niobium Niobium Nitride Niobium Oxide	50Å/sec at 25 oC	Negative* & Positive	Microelectronics
Ni-Cr	NICHROME ETCHANTS TFC TFN	20Å/sec at 25 °C 50Å/sec at 40 °C	Negative* & Positive	Thin Film Circuits
Ni	NICKEL ETCHANTS TFB TFG Type I	30Å/sec at 25 °C 50Å/sec at 40 °C 3 mil/hr at 40 °C	Negative* & Positive	Thin Film Circuits
Ni-V	Nickel-Vanadium Etch	30 A/sec at 20 °C	Negative&Positive	Microelectronics
Pd	PALLADIUM ETCHANTS Pd Etch 1:1 TFP	110Å/sec at 50 °C	Negative* & Positive	Semiconductor & Thin Film Circuits
Pt	PLATINUM ETCHANT 1:1	10Å/sec at 25 °C	Positive	Semiconductor & Thin Film Circuits
Ru	RUTHENIUM ETCH	20 A/sec at 20 °C	Negative&Positive	Microelectronics
	REAGENT SEMICONDUCTOR ETCHANTS (RSE)
	SEMICONDUCTOR DEFECT DELINEATION ETCHANTS
Si	REAGENT SEMICONDUCTOR ETCHANTS (RSE) SILICON SLOW ETCH SILICON MESA ETCH PREFERENTIAL SILICON ETCHANTS PSE 200 PSE 300 SOLAR CELL ETCHANTS SCE-200 SCE-300 WRIGHT ETCHANT WRIGHT-JENKINS ETCHANT SIRTL ETCHANT	Variable Variable Variable 1 mil/3 min at 100 °C 25 ㎛/hr at 100 °C 1 hr at 75-100 °C 5-10 min at 118 °C Defect Characterization Defect Characterization Defect Characterization	KMER PKP Type I <110> <100> <110> <100> N/A N/A N/A	Semiconductor Devices Semiconductor Devices MEMS Semiconductors Solar Cells Semiconductor Testing Semiconductor Testing Semiconductor Testing
SiC	SILICON CARBIDE	80 A/min	Negative	LED
SiO2	BUFFER HF IMPROVED BD ETCHANT SILOXIDE ETCH TIMETCH SILOX VAPOX III BUFFERED OXIDE ETCHANTS (BOE)	800Å/min at 25 °C Thermally Grown Variable 40Å/sec at 25 °C 90Å/min at 25 °C 4000Å/min at 22 °C Variable	Negative* & Positive	Semiconductor & Integrated Circuits PSG/BSG CVD CVD CVD
SiO	SILICON MONOXIDE ETCH	5000Å/min at 85 °C	Negative* & Positive	Semiconductor Devices
Si3N4	TRANSETCH N	125 Å/min at 180 °C	SiO2 (Silox)	Semiconductor & Integrated Circuits
Ag	SILVER ETCHANT TFS	200 Å/sec at 25 °C	Negative* & Positive	Semiconductor & Thin Film Circuits
Stainless Steel	Nickel Etch Type I	45 Å/sec at 25 °C, AISI 316	Negative* & Positive	Alloys
Ta Ta3N5 Ta2O5	SIE-8607 Ta Etch 111	70 Å/sec at 25 °C 30 Å/sec at 25 °C	Negative* & Positive	Capacitors Semiconductors
TaSi	Tantalum Silicide Etch	50 A/sec at 20 °C	Negative&Positive	Thin Film Electronics/TD>
Ti	TITANIUM ETCHANTS TFT TFTN	25 Å/sec at 20 °C 50 Å/sec at 30 °C 10 Å/sec at 70 °C 50 Å/sec at 85 °C	Negative* & Positive	Integrated Circuits SiO2 Compatible
TiN	Titanium Nitride Etch	30 A/sec at 20 °C	Negative&Positive	Microelectronics
Ti-W	TI-TUNGSTEN ETCHANT TiW-30	20-30 Å/sec	Negative* & Positive	Thin Film Circuits Adhesion Layer
W	TUNGSTEN ETCH TFW	140 Å/sec at 30 °C	Negative* & Positive	Integrated Circuits
SnO	NESA ETCHANT TE-100	0.02 micron/min at 20 °C	Screen Resists	Electronic Circuits
	ELECTRONIC GRADE CHEMICALS (SOLVENTS, ACIDS)

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Taekwang Trading Co., Ltd.

Minisite Heart

Country / Year Established: South Korea /

Business type: Others

DUNS

President: CHO, HONG-HEE

Address: 99-3, Garak-dong, Songpa-gu, SEOUL, KOREA

Product Category: Dictionaries & Translators,Other Chemicals

No. of Total Employees: 1-50

Company introduction: Our company specializes in selling and developing the chemicals, instrumental products related to operating the sample to mainly microelectronics surface application and semiconductor in micro scale.

Through a long years of operations to perform our best business service in the this field, we have established a large customer'credits and is competent and ready to help resolve technical problems and to engage in the development of special materials for our customers.

We are happy to work with your engineers and scientists to provide timely, cost-effective solutions to your company's needs good in microelectronic and semiconductor.

We create the future to offer the best business service worth to our customers and enlarge our business to more products as a leading company of microelectronic,

Best Regards.