Rare earth oxide include CeO2, La2O3,Sc2O3

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rare earth oxide, scandium, sputtering target, polished powder,
Industrial Supplies , Magnetic Materials , Other Minerals & Metallurgy Products , Oxide
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Huizhou Tian Yi Rare Material Co.,Ltd

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China China /
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Product name Rare earth oxide include CeO2, La2O3,Sc2O3 Certification -
Category Industrial Supplies
Magnetic Materials
Other Minerals & Metallurgy Products
Ingredients -
Keyword rare earth oxide , scandium , sputtering target , polished powder Unit Size -
Brand name TYR Unit Weigh -
origin Stock -
Supply type - HS code -

Product Information


Rare Earth Oxide

 Our Rare Earth Oxide Product list as following:

Nanometer Rare Earth Oxide   Rare Earth Oxide Powder   Rare Earth Oxide Sputtering Targets  Rare Earth Oxide Evaporation Material

Rare Earth Oxide Powder:<20un, <10um, <5um e.t.c particle size

Nanometer Rare Earth Oxide:  D50: 50nm e.t.c 

Rare Earth Oxide Sputtering Targets : Discs, plate, rod, tube, sheet, Delta, and per drawing,Diameter: 355.6mm (14") max. Single piece Size: Length: <254mm, Width: <127mm, Thickness: >1mm, if larger size than this, we can do it as tiles joint by 45 degree or 90 degree

Rare Earth Oxide Evaporation Material:Granules, chunks, rods, wire, foil, pellets and made as requested 


Material Name


Available form

Rare Earth Oxide Lanthanum 

La2O3/TREO: 99.99%, 99.999%, TREO:99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Cerium

CeO2/TREO: 99.9%, 99.99%, 99.999%, TREO:99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Praseodymium

Pr6O11/TREO:99.5%, 99.99%, TREO:99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Neodymium

Nd2O3/TREO:99.5%, 99.99%, TREO:99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Samarium

Sm2O3/TREO:99.99%, TREO:99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Europium 

Eu2O3/TREO: 99.99%, 99.999%, TREO:99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Gadolinium

Gd2O3/TREO: 99.99%, 99.999%, TREO:99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Terbium

Tb4O7/TREO:99.95%, 99.99%, TREO:99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Dysprosium

Dy2O3/TREO:99.9%, TREO: 99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Erbium

Er2O3/TREO:99.9%, TREO: 99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Holmium

Ho2O3/TREO:99.9%, TREO: 99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Thulium

Tm2O3/TREO:99.99%, TREO:99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Ytterbium

Yb2O3/TREO: 99.99%, 99.999%, TREO:99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Lutetium

Lu2O3/TREO:99.99%, TREO:99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Scandium

Sc2O3/TREO: 99.9%, 99.99%, 99.999%, TREO: 99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

Rare Earth Oxide Yttrium

Y2O3/TREO: 99.99%, 99.999%, TREO:99%

 Powder,Sputtering Targets,Evaporation Material, Nanometer

B2B Trade

Price (FOB) Negotiable transportation -
MOQ Negotiable Leadtime Negotiable
Payment Options Negotiable Shipping time Negotiable

Huizhou Tian Yi Rare Material Co.,Ltd

Country / Year Established
China China /
Business type


Amy Chiu
12 K of Shiji, Shijixingtian Bldg, YanDa Road, Huizhou, China
Product Category
Industrial Supplies,Other Minerals & Metallurgy Products,Semiconductors
No. of Total Employees
Company introduction
TYR has been established in 2004 year, specializes in a wide category of sputtering targets, evaporation source material, rare earth material and chemistry reagent, PVD materials base on metals, alloys, compounds. we offer targets bonding service, we serving government research establishments, universities and high technology industries. We using a variety of specialized processes including hot pressing, hot/cold isostatic pressing, and vacuum melting, vacuum sintering, we can provide the kind of homogenous, fine-grained, high-density materials that conform to the strictest quality control, we always aim to put quality first. Our product list include Metal sputtering targets, Alloy sputtering targets, Noble metal sputtering targets, Noble alloy sputtering targets, Oxide Ceramic Sputtering targets, Boride Ceramic Sputtering Targets, Carbide Ceramic Sputtering Targets, Fluoride Ceramic Sputtering Targets, Nitride Ceramic Sputtering Targets, Sulfide Ceramic Sputtering Targets, Selenide Ceramic Sputtering Targets, Silicide Ceramic Sputtering Targets, Telluride Ceramic Sputtering Targets, metal evaporation source, alloy evaporation source, optical thin film coating material, rare earth oxide and each high pure chemistry reagent. Sputtering Targets Materials list: High Pure Metal Sputtering Targets: Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper (Cu), Dysprosium (Dy), Erbium (Er), Eur (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, (C), Hafnium (Hf), Holmium (Ho), Iridium (Ir), Indium (In), Iron (Fe), Lanthanum (La), Lead (Pb), Lutetium (Lu), Manganese (Mn), Molybdenum (Mo), Magnesium (Mg), Neodymium (Nd), Niobium (Nb), Nickel (Ni), Palladium (Pd), Platinum (Pt), Praseodymium (Pr), Rhenium (Re), Ruthenium (Ru), Samarium (Sm), Scandium (Sc), Selenium (Se), Silicon (Si), Silver (Ag), Tantalum (Ta), Terbium (Tb), Tellurium (Te),Tin (Sn), Thulium (Tm), Titanium (Ti), Tungsten (W), Vanadium (V), Ytterbium (Yb), Yttrium (Y), Zirconium (Zr), Zinc (Zn) ; Alloy Sputtering Targets: Al alloy targets, Al-Cu, Al-Cr, Al-Nd, Al-Si, Al-Si-Cu, Al-Ag Cu alloy targets: Cu-Ag, Cu-Co, Cu-Ga, Cu-In, Cu-Ni Co alloy targets: Co-Cr, Co-Cr-Mo, Co-Fe, Co-Fe-B ,Co-Ni, Co-Ni-Cr, Co-Pt Ni alloy targets: Ni-Al, Ni-Cr, Ni-Cr-Si, Ni-Fe, Ni-Mn, Ni-Ti, Ni-V, Ti alloy targets: Ti-Al, Ti-Ni, Ti-Zr, Ti-Co Ta alloy targets: Ta-Al, Ta-W W alloy targets: W-Ti, W-Mo, W-B, W-Re Mo alloy targets: Mo-Nb, Mo-Si, Mo-Al Fe alloy targets: Fe-B, Fe-Co, Fe-Mn, Fe-Hf, Fe-Gd, Fe-Tb Zr alloy targets: ZrAl, ZrCu, ZrFe, ZrNb, ZrNi, ZrTi, ZrY, Noble alloy targets: Au-Ag, Ag-Cu, Ir-Mn, Ir-Re, Ir-Ru, Au-Sn, Ag-In, Ag-Sn e.t.c Ceramic sputtering target: Oxide Ceramic Sputtering targets: Al2O3, AZO, Sb2O3, ATO, BaTiO3, Bi2O3, CeO2, CuO, Cr2O3, Dy2O3, Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2, HfO2, Ho2O3, In2O3, In2O3-SnO2 (ITO), Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3, LiNbO3, Lu2O3, MgO, MoO3, Nd2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2, Tm2O3, TiO, TiO2, Ti3O5, Ti2O3, SnO2, SnO, WO3, WO3-Li, V2O5, VO2, Yb2O3, Y2O3, Y2O3-ZrO2 (YSZ), YBCO, ZnO, ZnO:Al, ZnO-In2O3, ZrO2, ZrO2-5-15wt%CaO) Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, FeB, HfB2 ,LaB6, Mo2B, Mo2B5 ,NbB, TaB2, TiB2, W2B5, WB, VB, YB6, ZrB2 Carbide Ceramic Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, W2C, VC, ZrC Fluoride Ceramic Sputtering Targets : AlF3, BaF2, CaF2, LiF, MgF2, NaF, Na3AlF6, YF3, YbF3 Nitride Ceramic Sputtering Targets :AlN, BN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN Sulfide Ceramic Sputtering Targets: CuS, Cu2S, CdS, FeS, FeS2, GeS, SnS, In2S3, MoS2, TaS2, WS2, ZnS Selenide Ceramic Sputtering Targets: Bi2Se3, CdSe, CuSe, Ga2Se3, In2Se3, PbSe, MoSe2, NbSe2, TaSe2, WSe2, ZnSe Silicide Ceramic Sputtering Targets: Cr3Si, CrSi2, CoSi2, HfSi2, MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2, ZrSi2 Telluride Ceramic Sputtering Targets: Bi2Te3, CdTe, CuTe, Ga2Te3, GeTe, PbTe, MoTe2, NbTe2, TaTe2, WTe2, ZnTe
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