Thermal CVD system of the VTS corporation is thin film deposition equipment using a reaction to adhere gas atoms onto a plate by ionizing the reactive gas with the thermal source energy.
1. Chamber: Water cooled double wall chamber
2. Sample size: Max 50 x 500 mm
3. Base pressure: < 9E-4 Torr
4. RF plasma: RF power supply 600W
5. Heater: Hot wall resistance heater
6. Heating control: 3-zone heating control
7. Operating temp.: ~950degree C (Max. 1,000degree C)
8. Process gas: Ar, H2, CH4
VTS Corporation is manufacturer of LED, Solar, Touch screen panel peocess equipments.
We suppy MOCVD system for LED, Screen printer and firing furnace fo Solar and Roll to roll sputtering system for Touch Screen Panel productions...